QUALIFLOW LVC-414 Specification
| Manufacturer | QUALIFLOW | Product Number | 54-107950A15 |
| Device Type | Liquid Vapor Controller / Mass Flow Controller | Country of Origin | USA |
| Model Designation | LVC-414 (often registered under the sub-variant LVC-414-3) | Physical Dimensions | 12.5 x 18.5 x 7.8 cm |
QUALIFLOW LVC-414 Features
High-Precision Vaporization: Designed for accurate heating and vaporizing of liquid precursors in semiconductor environments.
Integrated Flow Control: Combines liquid mass flow metering and gas vaporization control into a single, compact unit.
Semiconductor Process Compatibility: Optimized for Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) applications.
Ultra-High Purity Materials: Constructed with corrosion-resistant, high-purity components to prevent process and wafer contamination.
Fast Closed-Loop Response: Features rapid response times for dynamic and stable vapor output regulation.
Compact Modular Design: Small physical footprint (approx. 12.5 x 18.5 x 7.8 cm) allowing easy integration into existing gas panels.
Standard Industrial Interfacing: Equipped with standard electrical and communication connectors for seamless PLC and tool integration.
High Reliability: Engineered for continuous 24/7 operation in harsh industrial manufacturing environments.
If you want to more details about QUALIFLOW LVC-414,please contact me without hesitate. Email:sales@sparecenter.com
QUALIFLOW 54-107950A15 Application
Semiconductor Wafer Fabrication: QUALIFLOW 54-107950A15 delivers precise vaporized chemical precursors to critical processing chambers during semiconductor manufacturing.
Chemical Vapor Deposition (CVD): QUALIFLOW 54-107950A15 regulates the exact vapor flow rate required for uniform thin-film growth on silicon substrates.
Atomic Layer Deposition (ALD): QUALIFLOW 54-107950A15 controls ultra-precise, layer-by-layer material deposition at the atomic scale for advanced chip production.
Silicon Epitaxy Processing: QUALIFLOW 54-107950A15 manages gas-phase chemical delivery during crystal growth processes on semiconductor wafers.
Optical Fiber Manufacturing: QUALIFLOW 54-107950A15 controls vaporized raw materials used in the chemical deposition phase of fiber optic preform production.
Advanced Material Coating: Services industrial coating systems requiring stable, repeatable vapor delivery for high-performance surface modifications.
Gas Panel Integration: QUALIFLOW 54-107950A15 functions as a core sub-assembly within modular gas and liquid delivery manifolds of specialized automated machinery.
QUALIFLOW 54-107950A15 Images
LVC-414 54-107950A15 Vapor Controller
LVC-414 54-107950A15 Vapor Controller
LVC-414 54-107950A15 Vapor Controller
LVC-414 54-107950A15 Vapor Controller
LVC-414 54-107950A15 Vapor Controller FAQ
Q: What is the primary function of the QUALIFLOW LVC-414 54-107950A15 within industrial manufacturing?
A: The LVC-414 54-107950A15(LVC-414 54-107950A15 Vapor Controller) operates as a specialized Liquid Vapor Controller designed to precisely meter liquid chemical precursors, heat them to vaporization, and deliver a highly controlled gas-phase flow to high-purity processing chambers.
Q: Which critical semiconductor fabrication processes rely on the QUALIFLOW LVC-414 54-107950A15?
A: The LVC-414 54-107950A15 is primarily used in advanced thin-film applications, specifically Chemical Vapor Deposition (CVD), Atomic Layer Deposition (ALD), and silicon epitaxy processing, where precise vapor flux stability is mandatory.
Q: How does the design of the QUALIFLOW LVC-414 54-107950A15 prevent chemical process contamination?
A: The LVC-414 54-107950A15 is engineered using ultra-high purity, corrosion-resistant wetted materials and metal seals, which completely eliminates particle generation and prevents outgassing from contaminating delicate wafers.
Q: Can the QUALIFLOW LVC-414 54-107950A15 be seamlessly integrated into existing legacy gas panels?
A: Yes, the compact form factor and standardized industrial connections of the LVC-414 54-107950A15 allow it to serve as a direct drop-in replacement or component upgrade in modern fluid distribution manifolds.
Q: What is the standard troubleshooting procedure if the QUALIFLOW LVC-414 54-107950A15 exhibits a flow tracking error?
A: If a deviation occurs, technicians must verify the inlet liquid pressure stability, inspect the internal heating elements, and utilize the communication interface of the LVC-414 54-107950A15 to check for loop calibration drift or internal clogging.
Q: Where can industrial facilities source replacement parts or refurbished units for the QUALIFLOW LVC-414 54-107950A15?
A: You can purchase the LVC-414 54-107950A15 directly from our spare center, where we supply certified, high-quality replacements and original components tailored for your industrial machinery.
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